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Material Deposition Facilities

Sputtering Leybold Z400

DC and RF magnetron sputtering system equipped with:

  • three PK 75 sputtering cathodes (2 inches diameter)

  • 1 kW RF sputtering power supply with Voltage, Current, DC Potential and DC Bias controls

  • 1.8 kW DC sputtering power supply

  • 3 gas inlet control system equipped with needle valve, gas flow meters and MKS

  • vacuum pumping system with Pfeiffer rotative pump and Turbovac 450 turbomolecular pump

Microwave CVD System

Microwave CVD system up to 2.45GHz equipped with:

  • 1.5 kW Microwave Power Supply (Astex 1500)

  • 4 gas inlet control system equipped with needle valve, gas flow meters and MKS

  • UHV vacuum chamber with two rotative and one turbomolecular pumps

Hot Filament CVD System
Pulsed Laser Deposition System

PLD system equipped with a ArF or KrF (193 or 248 nm) pulsed laser source (Lambda Physik COMPex)

  • High Vacuum chamber with rotative and turbomolecular pumps

  • Lamps for samples heating up to a temperature of 700°C

  • Three rotative 1 inch targets

  • RF generator for plasma coupling

  • 3 gas inlet control system equipped with needle valve, gas flow meters and MKS

RF CVD System
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